Key low temperature processes for a silicon-based 3D sequential integration

Xavier Garros (1) , Perrine Batude (1) , Claire Fenouillet-Beranger , Laurent Brunet (1) , Camila Calvacante , Tadeu Mota Frutuoso (1) , Remy Gassilloud , Mickael Ribotta (1) , Laurent Brevard (1) , Valerie Lapras (1) , François Andrieu , Fréd Gaillard

1 DCOS - Département Composants Silicium

Domaines: Micro et nanotechnologies/Microélectronique

Xavier Garros, Perrine Batude, Claire Fenouillet-Beranger, Laurent Brunet, Camila Calvacante, et al.. Key low temperature processes for a silicon-based 3D sequential integration. 2022 IEEE SYMPOSIUM ON VLSI TECHNOLOGY AND CIRCUITS, Jun 2022, Honolulu, United States. ⟨cea-03740747⟩