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CVD nanodiamond thin films as high yield photocathodes driven by UV laser pulses

Abstract : We present here an UV (266nm) photoemission setup dedicated to measure properties of conductive materials under DC extraction field as photocathodes. We have successfully tested copper, as reference material, and silicon samples. It allowed us testing photoemission properties of thin CVD nanodiamond films on silicon substrates. We demonstrate a strong influence on silicon doping type on the photoemission yield, pointing out a clear influence of the nanodiamond-silicon interface in the photoemission process. Furthermore, the nanodiamond-silicon structure exhibits one order of magnitude higher photoemission current compared to copper test samples.
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https://hal-cea.archives-ouvertes.fr/cea-01913425
Contributor : Marie-France Robbe Connect in order to contact the contributor
Submitted on : Tuesday, November 6, 2018 - 11:54:35 AM
Last modification on : Friday, June 25, 2021 - 10:00:02 AM

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Jean-Paul Mazellier, Cyril Di Giola, Pierre Legagneux, Clément Hébert, Emmanuel Scorsone, et al.. CVD nanodiamond thin films as high yield photocathodes driven by UV laser pulses. 2014 27th International Vacuum Nanoelectronics Conference (IVNC), Jul 2014, Engelberg, Switzerland. pp.6894736, ⟨10.1109/IVNC.2014.6894736⟩. ⟨cea-01913425⟩

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