CVD nanodiamond thin films as high yield photocathodes driven by UV laser pulses - CEA - Commissariat à l’énergie atomique et aux énergies alternatives Accéder directement au contenu
Communication Dans Un Congrès Année : 2014

CVD nanodiamond thin films as high yield photocathodes driven by UV laser pulses

Résumé

We present here an UV (266nm) photoemission setup dedicated to measure properties of conductive materials under DC extraction field as photocathodes. We have successfully tested copper, as reference material, and silicon samples. It allowed us testing photoemission properties of thin CVD nanodiamond films on silicon substrates. We demonstrate a strong influence on silicon doping type on the photoemission yield, pointing out a clear influence of the nanodiamond-silicon interface in the photoemission process. Furthermore, the nanodiamond-silicon structure exhibits one order of magnitude higher photoemission current compared to copper test samples.
Fichier non déposé

Dates et versions

cea-01913425 , version 1 (06-11-2018)

Identifiants

Citer

Jean-Paul Mazellier, Cyril Di Giola, Pierre Legagneux, Clément Hébert, Emmanuel Scorsone, et al.. CVD nanodiamond thin films as high yield photocathodes driven by UV laser pulses. 2014 27th International Vacuum Nanoelectronics Conference (IVNC), Jul 2014, Engelberg, Switzerland. pp.6894736, ⟨10.1109/IVNC.2014.6894736⟩. ⟨cea-01913425⟩
33 Consultations
0 Téléchargements

Altmetric

Partager

Gmail Facebook X LinkedIn More