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Manganese behaviour in ZnO layers deposited by magnetron sputtering for spintronic application

Abstract : In this work, we carry out structural analysis of ferromagnetic Mn-doped ZnO thin films deposited by radio frequency magnetron sputtering, using transmission electron microscopy (TEM). On top of sapphire (0001) substrates, Mn rich precipitates and an interface reaction layer are observed following the deposition of Zn(Mn)O layers above 500 °C. The crystalline quality of ZnO layers deposited by magnetron sputtering is highly improved at 500 °C as well as the measured ferromagnetic response.
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https://hal-cea.archives-ouvertes.fr/cea-00273866
Contributor : Chantal Brassy <>
Submitted on : Wednesday, April 16, 2008 - 3:15:18 PM
Last modification on : Friday, November 13, 2020 - 4:22:01 PM

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  • HAL Id : cea-00273866, version 1

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Morad Abouzaid, Pierre Ruterana, C. Liu, H . Morkoç. Manganese behaviour in ZnO layers deposited by magnetron sputtering for spintronic application. physica status solidi (a), Wiley, 2008, 205 (1), pp.80-82. ⟨cea-00273866⟩

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