Manganese behaviour in ZnO layers deposited by magnetron sputtering for spintronic application

Morad Abouzaid (1) , Pierre Ruterana (1) , C. Liu (2) , H . Morkoç (3)

1 CIMAP - UMR 6252 - Centre de recherche sur les Ions, les MAtériaux et la Photonique
2 Department of Physics and Astronomy [Seoul]
3 Department of Electrical Engineering,

In this work, we carry out structural analysis of ferromagnetic Mn-doped ZnO thin films deposited by radio frequency magnetron sputtering, using transmission electron microscopy (TEM). On top of sapphire (0001) substrates, Mn rich precipitates and an interface reaction layer are observed following the deposition of Zn(Mn)O layers above 500 °C. The crystalline quality of ZnO layers deposited by magnetron sputtering is highly improved at 500 °C as well as the measured ferromagnetic response.

Domaines: Science des matériaux [cond-mat.mtrl-sci]

Morad Abouzaid, Pierre Ruterana, C. Liu, H . Morkoç. Manganese behaviour in ZnO layers deposited by magnetron sputtering for spintronic application. physica status solidi (a), 2008, 205 (1), pp.80-82. ⟨cea-00273866⟩