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Article Dans Une Revue Proceedings of the National Academy of Sciences of the United States of America Année : 2021

Atomistic investigation of surface characteristics and electronic features at high-purity FeSi(110) presenting interfacial metallicity

Résumé

Significance Iron silicide (FeSi) provides multiple fascinating features whereby intriguing functional properties bearing significant application prospects were recognized. FeSi is understood notably as a correlated d -electron narrow-gap semiconductor and a putative Kondo insulator, hosting unconventional quasiparticles. Recently, metallic surface conduction channels were identified at cryogenic conditions and suggested to play a key role in the resistivity of high-quality single-crystalline specimens. Motivated by these findings, we prepared and closely examined a FeSi(110) surface with atomistically defined termination and topography. In the low-temperature regime, where surface metallicity emerges, the electronic band gap undergoes a subtle evolution. The pertaining key features, asymmetrization of the gap shape and formation of in-gap states, underscore the similarity of FeSi to unequivocal topological Kondo insulator materials.

Dates et versions

cea-04075085 , version 1 (19-04-2023)

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Biao Yang, Martin Uphoff, Yi-Qi Zhang, Joachim Reichert, Ari Paavo Seitsonen, et al.. Atomistic investigation of surface characteristics and electronic features at high-purity FeSi(110) presenting interfacial metallicity. Proceedings of the National Academy of Sciences of the United States of America, 2021, 118 (17), ⟨10.1073/pnas.2021203118⟩. ⟨cea-04075085⟩
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