A mixed method to mitigate the TID effects on 28nm FDSOI transistors
Résumé
In this work we propose a mixed method to mitigate the effects of Total Ionizing Dose (TID) on 28 nm Fully-Depleted Silicon-On-Insulator (FDSOI) MOSFETs exposed to 60Co gamma radiation at two different dose rates. This new thermal-electrical method uses thermal regeneration by applying rapid annealing cycles in addition to threshold voltage modulation inherent in FDSOI technology. Applying this methodology could enhance the transistor reliability during a mission in radiative environments.
Mots clés
instrumentation
nuclear instrumentation
ionizing radiation
Total Ionizing Dose
Fully-Depleted Silicon-On-Insulator (FDSOI)
gamma-rays
dosimetry
dose rate
thermal regeneration
annealing
transistor
reliability
Defect
Degradation
Rapid thermal annealing
Silicon-on-insulator
Threshold voltage
Integrated circuit reliability
electric compensation
elemental semiconductors
modulation
MOSFET
semiconductor device reliability
silicon
silicon-on-insulator
FDSOI
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