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Dry etching study of 3D Grayscale micrometric patterns into a polymer layer

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cea-03773457 , version 1 (09-09-2022)

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Assia Selmouni, Aurélien Tavernier, Sébastien Bérard-Bergery, Nicolas Posseme. Dry etching study of 3D Grayscale micrometric patterns into a polymer layer. MNE2022 Eurosensors - PESM Workshop, Micro and Nano Engineering, Sep 2022, Leuven, Belgium. ⟨cea-03773457⟩
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