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Dry etching study of 3D Grayscale micrometric patterns into a polymer layer

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https://hal-cea.archives-ouvertes.fr/cea-03773457
Contributor : Assia Selmouni Connect in order to contact the contributor
Submitted on : Friday, September 9, 2022 - 11:17:55 AM
Last modification on : Tuesday, September 13, 2022 - 3:38:11 AM

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Assia Selmouni, Aurélien Tavernier, Sébastien Bérard-Bergery, Nicolas Posseme. Dry etching study of 3D Grayscale micrometric patterns into a polymer layer. MNE2022 Eurosensors - PESM Workshop, Micro and Nano Engineering, Sep 2022, Leuven, Belgium. ⟨cea-03773457⟩

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