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Key low temperature processes for a silicon-based 3D sequential integration

Xavier Garros 1 Perrine Batude 1 Claire Fenouillet-Beranger Laurent Brunet 1 Camila Calvacante Tadeu Mota Frutuoso 1 Remy Gassilloud Mickael Ribotta 1 Laurent Brevard 1 Valerie Lapras 1 François Andrieu Fréd Gaillard 
1 DCOS - Département Composants Silicium
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Conference papers
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https://hal-cea.archives-ouvertes.fr/cea-03740747
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Submitted on : Friday, July 29, 2022 - 7:38:29 PM
Last modification on : Friday, August 5, 2022 - 3:38:55 AM

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  • HAL Id : cea-03740747, version 1

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Xavier Garros, Perrine Batude, Claire Fenouillet-Beranger, Laurent Brunet, Camila Calvacante, et al.. Key low temperature processes for a silicon-based 3D sequential integration. 2022 IEEE SYMPOSIUM ON VLSI TECHNOLOGY AND CIRCUITS, Jun 2022, Honolulu, United States. ⟨cea-03740747⟩

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