Simply implants, Photon International, pp.48-53, 2013. ,
19.3% efficiency on p-type silicon solar cells by Pulsion plasma-immersion implantation, Energy Procedia, vol.33, pp.18-23, 2013. ,
Phosphorus emitter engineering by plasma-immersion ion implantation for c-Si solar cells, Solar Energy Materials and Solar Cells, vol.133, pp.194-200, 2015. ,
URL : https://hal.archives-ouvertes.fr/cea-02570721
The applications of plasma immersion ion implantation to crystalline silicon solar cells, Energy Procedia, vol.38, pp.289-296, 2013. ,
Realization of conformal doping on multicrystalline silicon solar cells and black silicon solar cells by plasma immersion ion implantation, Chinese Physics B, vol.23, p.118801, 2014. ,
7% efficient ion-implanted large area n-type front junction silicon solar cells with rear point contacts formed by laser opening and physical vapor deposition, Progress in Photovoltaics: Research and Applications, vol.20, pp.1030-1039, 2014. ,
Understanding of the annealing temperature impact on ion implanted bifacial n-type solar cells to reach 20.3% efficiency, Progress in Photovoltaics: Research and Applications, 2014. ,
URL : https://hal.archives-ouvertes.fr/cea-02570664
Industrial ion implanted co-annealed and fully screen-printed bifacial n-PERT solar cells with low-doped back-surface fields, 2015. ,
Fully implanted rear emitter n-type (FIRE) solar cells, Proceedings of the 29 th European Photovoltaics and Solar Energy Conference, pp.867-870, 2014. ,
Excimer laserprocessed oxide-passivated silicon solar cells of 19.5-percent efficiency, IEEE Electron Dev Lett, vol.8, pp.249-251, 1987. ,
Glow discharge implanted, thermally annealed, oxide Solar-grade B emitters and role of the co-implanted F A. Lanterne et al. passivated silicon solar cells of 19% efficiency, Applied Physics Letters, vol.50, p.469, 1987. ,
N-type bifacial cell using simplified ion doping system, 40 th IEEE PVSC Conference, pp.3649-3653, 2014. ,
Characterization of an industrial plasma immersion ion implantation reactor with a Langmuir probe and an energy-selective mass spectrometer, Surface and Coatings Technology, vol.156, pp.119-124, 2002. ,
Plasma diagnostics in pulsed plasma doping (P2LAD) system, IEEE Transactions on Plasma Science, vol.32, pp.456-453, 2004. ,
Simulation of BF3 plasma immersion ion implantation into silicon, AIP Conference Proceedings, vol.1496, p.233, 2012. ,
Diffusion of boron near projected ranges of B and BF2 ions implanted in silicon, Japanese Journal of Applied Physics, vol.47, p.8696, 2008. ,
Cross-sectional transmission electron microscope study of residual defects in BF 2 + -implanted ,
, Journal of Applied Physics, vol.60, p.3114, 1986.
Préamorphisation du silicium par l'ion germanium et formation de junctions ultra-fines P+/N, PhD Dissertation, 1994. ,
Activation improvement of ion implanted boron in silicon through fluorine co-implantation, Journal of Vacuum Science and Technology B, vol.22, p.592, 2004. ,
Effect of fluorine on the diffusion of boron in ion implanted Si, Applied Physics Letters, vol.73, pp.1263-1265, 1998. ,
A comparative study of dopant activation in boron, BF2, arsenic, and phosphorus implanted silicon, IEEE Transactions on Electron Devices, 2002. ,
Fluorine interaction with point defects, boron, and arsenic in ion-implanted Si, Applied Physics Letters, vol.80, p.3530, 2002. ,
Effect of fluorine co-implant on boron diffusion in germanium preamorphized silicon during post-LSA rapid thermal annealing, IEEE Transactions on Semiconductor Manufacturing, vol.24, pp.333-337, 2011. ,
Étude, réalisation et intégration de jonctions P+/N ultra-fines pour les technologies CMOS inférieures à 0,18 micromètre, 2000. ,
Influence of boron clustering on the implanted emitter quality of silicon solar cells: an atom probe tomography study, Progress in Photovoltaics: Research and Applications, 2015. ,
URL : https://hal.archives-ouvertes.fr/hal-01929136
Evaluation of implantation annealing for highly-doped selective boron emitters suitable for screen-printed contacts, Solar Energy Materials and Solar Cells, vol.120, pp.431-435, 2014. ,
Ion implantation of boric molecules for silicon solar cells, Solar Energy Materials and Solar Cells, vol.142, pp.12-17, 2015. ,
Plasma immersion ion implantation of boron for ribbon silicon solar cells, EPJ Photovoltaics, vol.4, p.45105, 2013. ,
Effect of microwave radiation on boron activation, 14th International Conference on Ion Implantation Technology, vol.544, 2002. ,
Anomalous diffusion of fluorine in silicon, Applied Physics Letters, vol.61, pp.1310-1312, 1992. ,
Solar-grade B emitters and role of the co-implanted F A ,