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GAS FLOW IN A NEWTORK OF NANOCHANNELS OF VARYING DEPTH MADE BY GRAYSCALE LASER LITOGRAPHY

Abstract : A procedure is given to manufacture glass-silicon network of nanochannels being 10 et956;m in width and 100 to 500 nm in depth. The process is based on grayscale laser lithography to structure a photosensitive polymer resin in a single step. This is followed by a reactive ion etching step to transfer the resist depth profile into silicon. Experimental leak rate measurements are then carried out on the fabricated networks by applying a given pressure at the inlet and near vacuum conditions at the outlet where a mass spectrometer is used for flow-rate measurement. Numerical simulations using a pore-network model are performed by modelling the flow with a family of slip models. Their ability to represent the global leak rate of a heterogeneous network of conductances when near vacuum condition is applied at the outlet is analyzed.
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https://hal-cea.archives-ouvertes.fr/cea-02339337
Contributor : Bibliothèque Cadarache <>
Submitted on : Wednesday, October 30, 2019 - 1:39:06 PM
Last modification on : Monday, August 31, 2020 - 9:36:05 AM

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  • HAL Id : cea-02339337, version 1

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T. Zaouter, D. Lasseux, M. Prat, F. Ledrappier, K. Vulliez, et al.. GAS FLOW IN A NEWTORK OF NANOCHANNELS OF VARYING DEPTH MADE BY GRAYSCALE LASER LITOGRAPHY. MicroFluidics and Non-Equilibrium Gas Flows Conference 2018, Feb 2018, Strasbourg, France. ⟨cea-02339337⟩

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