In situ ptychographic measurements of high-order harmonic sources from plasma mirrors: A theoretical and numerical study - CEA - Commissariat à l’énergie atomique et aux énergies alternatives Accéder directement au contenu
Article Dans Une Revue Physics of Plasmas Année : 2018

In situ ptychographic measurements of high-order harmonic sources from plasma mirrors: A theoretical and numerical study

Résumé

Measuring the spatial properties of high-order harmonic beams produced by high-intensity laser-matter interactions directly in the target plane is very challenging due to the extreme physical conditions at stake in the interaction area. A measurement scheme has been recently developed to obtain this information experimentally, which consists in adapting a lensless imaging method known as ptychography. In this paper, we present a theoretical validation of this method in the case of harmonic generation from plasma mirrors, using a combination of simple modeling and 2D Particle-In-Cell simulations. This study investigates the concept of in situ ptychography and supports the analysis of experimental measurements presented in previous publications.
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Dates et versions

cea-02277465 , version 1 (03-09-2019)

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A. Leblanc, F. Quéré. In situ ptychographic measurements of high-order harmonic sources from plasma mirrors: A theoretical and numerical study. Physics of Plasmas, 2018, 25 (1), pp.013112. ⟨10.1063/1.5002523⟩. ⟨cea-02277465⟩
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