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Correlation between flat-band potential position and oxygenated termination nature on boron-doped diamond electrodes

Hugues Girard 1 Nathalie Simon 1 Dominique Ballutaud 2 Arnaud Etcheberry 1
1 ILV - Institut Lavoisier de Versailles
2 GEMAC - Groupe d'Etude de la Matière Condensée
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https://hal-cea.archives-ouvertes.fr/cea-02189562
Contributor : Hugues Girard <>
Submitted on : Friday, July 19, 2019 - 4:44:37 PM
Last modification on : Friday, January 10, 2020 - 3:42:19 PM

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Hugues Girard, Nathalie Simon, Dominique Ballutaud, Arnaud Etcheberry. Correlation between flat-band potential position and oxygenated termination nature on boron-doped diamond electrodes. Comptes Rendus Chimie, Elsevier Masson, 2008, 11 (9), pp.1010-1015. ⟨10.1016/j.crci.2008.01.014⟩. ⟨cea-02189562⟩

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