Fine electron biprism on a Si-on-insulator chip for off-axis electron holography

Abstract : Off-axis electron holography allows both the amplitude and the phase shift of an electron wavefield propagating through a specimen in a transmission electron microscope to be recovered. The technique requires the use of an electron biprism to deflect an object wave and a reference wave to form an interference pattern. Here, we introduce an approach based on semiconductor processing technology to fabricate fine electron biprisms with rectangular cross-sections. By performing electrostatic calculations and preliminary experiments, we demonstrate that such biprisms promise improved performance for electron holography experiments.
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Submitted on : Tuesday, July 16, 2019 - 3:59:43 PM
Last modification on : Wednesday, July 17, 2019 - 1:35:53 AM

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Martial Duchamp, Olivier Girard, Giulio Pozzi, Helmut Soltner, Florian Winkler, et al.. Fine electron biprism on a Si-on-insulator chip for off-axis electron holography. Ultramicroscopy, Elsevier, 2018, 185, pp.81-89. ⟨10.1016/j.ultramic.2017.11.012⟩. ⟨cea-02185407⟩

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