1μm Pitch direct hybrid bonding with <300nm wafer-to-wafer overlay accuracy

Abstract : Copper/oxide hybrid bonding process has been extensively studied these past years as a key enabler for 3D high density application with top and bottom tier interconnection pitch below 10μm. Since 2015 hybrid bonding process robustness has been confirmed on complete electrical test vehicles [1,2] as well as commercial products [3] integrating copper to copper interconnection pitchs close to 6μm. To our knowledge, no results have been shown today demonstrating sub-1.5μm pitch copper hybrid bonding feasibility.
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https://hal-cea.archives-ouvertes.fr/cea-02185349
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Submitted on : Tuesday, July 16, 2019 - 3:36:40 PM
Last modification on : Thursday, July 18, 2019 - 1:27:52 AM

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A. Jouve, V. Balan, N. Bresson, C. Euvrard-Colnat, F. Fournel, et al.. 1μm Pitch direct hybrid bonding with <300nm wafer-to-wafer overlay accuracy. 2017 IEEE SOI-3D-Subthreshold Microelectronics Technology Unified Conference (S3S), Oct 2017, Burlingame, Canada. pp.1-2, ⟨10.1109/S3S.2017.8309213⟩. ⟨cea-02185349⟩

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