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Precise control of template affinity achieved by UV-assisted graphoepitaxy approach on silicon nanowires applications

Patricia Pimenta-Barros 1, * Guillaume Claveau 1 Maxime Argoud 1 Zdenek Chalupa 1 Nacima Allouti 1 Corinne Comboroure 1 Gaëlle Chamiot-Maitral 1 Nicolas Posseme 1 Laurent Pain 1 Raluca Tiron 1 Christophe Navarro 2 Célia Nicolet 2 Ian Cayrefourcq 2
* Corresponding author
1 CEA-LETI - Commissariat à l'énergie atomique et aux énergies alternatives - Laboratoire d'Electronique et de Technologie de l'Information
2 ARKEMA FRANCE, Rue Estienne Orves, Colombes
Abstract : Directed Self Assembly (DSA) of block-copolymers (BCPs) is considered as a cost-effective solution to extend the performances of conventional lithography. In this work, we propose a smart surface modification technique to precisely control the surface affinity of guiding template used in the DSA graphoepitaxy process flows. The presented method consists in the UV irradiation of copolymers brushes in order to locally tune their surface affinity. By this way, we are able to differentiate the surface affinities of guide sidewalls (PMMA-attractive) and guide bottom (non-preferential affinity). A complete DSA-module is demonstrated and implemented on a 300mm integration flow dedicated to the creation of silicon nanowires-like transistor.
Keywords : Directed Self-Assembly (DSA) Graphoepitaxy Surface affinity UV modification Nanowires Etching Block-copolymers
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Conference papers
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https://hal-cea.archives-ouvertes.fr/cea-02185301
Contributor : Marianne Leriche <>
Submitted on : Tuesday, July 16, 2019 - 3:19:04 PM
Last modification on : Thursday, June 11, 2020 - 5:04:08 PM

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Patricia Pimenta-Barros, Guillaume Claveau, Maxime Argoud, Zdenek Chalupa, Nacima Allouti, et al.. Precise control of template affinity achieved by UV-assisted graphoepitaxy approach on silicon nanowires applications. Novel Patterning Technologies 2018, Feb 2018, San Jose, Canada. pp.11, ⟨10.1117/12.2297407⟩. ⟨cea-02185301⟩

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