Pillars fabrication by DSA lithography: material and process options

Ahmed Gharbi 1 Patricia Pimenta-Barros 1 Olivia Saouaf 1 Gabriel Reynaud 1 Laurent Pain 1 Raluca Tiron 1 Christophe Navarro 2 Célia Nicolet 2 Ian Cayrefourcq 2 Michele Perego 3 Francesc Perez-Murano 4 Esteve Amat 4 Marta Fernandez-Regulez 4
1 CEA-LETI - Laboratoire d'Electronique et des Technologies de l'Information
2 GRL - Groupement de recherches de Lacq
3 IMM-CNR - Laboratorio MDM
4 CNM - Centro Nacional de Microelectronica [Spain]
Abstract : We investigate the fabrication of sub-20 nm pillars by DSA lithography using PS-cylinder-forming PS-b-PMMA block copolymer (BCP). The approach is based on the removal of PMMA-matrix by either dry or wet etching to form PS pillars which act as a soft etching mask that can be further transferred to an intermediate hard one and then to the substrate. The process conditions of BCP self-assembly were optimized in terms of annealing temperature, brush layer composition and film thickness. It was demonstrated that PS/PMMA volume fractions of 50/50 in the PS-r-PMMA brush layer is the most adapted to obtain standing PS cylinders. Top-down SEM images showed a hexagonal array of PS cylinders in a PMMA matrix with a natural period of 33.5 nm (determined by Fast Fourier Transform FFT method) and CD around 15 nm. Both wet and dry etching strategies for PMMA removal were discussed. It was shown that UV exposure followed by organic solvent development is necessary to decrease pattern collapsing during PMMA removal step which is the most critical issue for pillar fabrication. PMMA removal by dry etching was shown to completely avoid this pattern collapsing. Finally, pillars etching transfer to typical organic Si containing antireflective coating and spin on carbon (SiARC/SOC) hard mask and then to the silicon substrate was demonstrated. Si pillars of 15 nm CD and 70 nm height were obtained with a straight profile shape. (c) SPIE 2019
Keywords : block copolymer self-assembly lithography pillars
Document type :
Conference papers
Complete list of metadatas

Cited literature [18 references]  Display  Hide  Download
https://hal-cea.archives-ouvertes.fr/cea-02087039
Contributor : Guido Rademaker <>
Submitted on : Monday, April 1, 2019 - 5:17:38 PM
Last modification on : Thursday, April 4, 2019 - 1:49:02 AM
Long-term archiving on : Tuesday, July 2, 2019 - 5:56:25 PM

File

105860Q _arch.pdf
Files produced by the author(s)

Identifiers

Collections

CEA | DRT | LETI | CEA-GRE

Citation

Ahmed Gharbi, Patricia Pimenta-Barros, Olivia Saouaf, Gabriel Reynaud, Laurent Pain, et al.. Pillars fabrication by DSA lithography: material and process options. Advances in Patterning Materials and Processes XXXV, Feb 2018, San Jose, United States. pp.105860Q, ⟨10.1117/12.2297414⟩. ⟨cea-02087039⟩

Export

BibTeX TEI DC DCterms EndNote

Share

Metrics

Record views

26

Files downloads

77

Contact

support.ccsd.cnrs.fr
hal.support@ccsd.cnrs.fr
Logo CCSD