OPTICAL SPECTROSCOPY AND X-RAY MICRODIFFRACTION STUDY OF HIGHLY STRAINED GE NANOSTRUCTURES

Kevin Guilloy (1) , Nicolas Pauc (1) , Alban Gassenq (1) , P. Gentile (1) , Samuel Tardif (2) , Francois Rieutord (2) , Vincent Calvo (1) , J.M. Escalante (3) , Ivan Duchemin (4) , Y. M. Niquet (5) , Guilherme Osvaldo Dias (4) , D. Rouchon (4) , J. Widiez (4) , J.M. Hartmann (4) , Alexei Chelnokov (4) , Vincent Reboud (4) , Richard Geiger (6) , Thomas Zabel (6) , Hans Sigg (6) , Jerome Faist (7)

1 SiNaps - Silicon Nanoelectronics Photonics and Structures
2 NRS - Nanostructures et Rayonnement Synchrotron
3 NTC-UPV - Nanophotonics Technology Centre, Universidad Politecnica de Valencia
4 CEA-LETI - Commissariat à l'énergie atomique et aux énergies alternatives - Laboratoire d'Electronique et de Technologie de l'Information
5 LSIM - Laboratory of Atomistic Simulation
6 PSI - Paul Scherrer Institute
7 ETH Zürich - Eidgenössische Technische Hochschule - Swiss Federal Institute of Technology [Zürich]

Domains: Physics [physics]; Condensed Matter [cond-mat]; Materials Science [cond-mat.mtrl-sci]; Engineering Sciences [physics]; Micro and nanotechnologies/Microelectronics; Engineering Sciences [physics]; Materials; Engineering Sciences [physics]; Optics / Photonic

Kevin Guilloy, Nicolas Pauc, Alban Gassenq, P. Gentile, Samuel Tardif, et al.. OPTICAL SPECTROSCOPY AND X-RAY MICRODIFFRACTION STUDY OF HIGHLY STRAINED GE NANOSTRUCTURES. 12th International Conference on Group IV Photonics, Aug 2015, Vancouver, Canada. ⟨cea-01998277⟩