Nonlinear strain dependences in highly strained germanium micromembranes for on-chip light source applications

Kévin Guilloy (1) , Alban Gassenq (1) , N. Pauc (1) , J.M. Escalante (2) , I. Duchemin (3) , Yann-Michel Niquet (3) , Samuel Tardif (4) , François Rieutord (5) , P. Gentile (1) , Guilherme Osvaldo Dias (6) , D. Rouchon (6) , Julie Widiez (6) , J.M. Hartmann (6) , D. Fowler (6) , Alexei Chelnokov (6) , Richard Geiger (7) , Thomas Zabel (7) , Hans Sigg (7) , Jerome Faist (8) , V. Reboud (6) , Vincent Calvo (1)

1 SiNaps - Silicon Nanoelectronics Photonics and Structures
2 NTC-UPV - Nanophotonics Technology Centre, Universidad Politecnica de Valencia
3 LSIM - Laboratory of Atomistic Simulation
4 NRS - Nanostructures et Rayonnement Synchrotron
5 MEM - Modélisation et Exploration des Matériaux
6 CEA-LETI - Commissariat à l'énergie atomique et aux énergies alternatives - Laboratoire d'Electronique et de Technologie de l'Information
7 PSI - Paul Scherrer Institute
8 ETH Zürich - Eidgenössische Technische Hochschule - Swiss Federal Institute of Technology [Zürich]

Domains: Physics [physics]; Condensed Matter [cond-mat]; Materials Science [cond-mat.mtrl-sci]; Engineering Sciences [physics]; Micro and nanotechnologies/Microelectronics; Engineering Sciences [physics]; Materials; Engineering Sciences [physics]; Optics / Photonic

Kévin Guilloy, Alban Gassenq, N. Pauc, J.M. Escalante, I. Duchemin, et al.. Nonlinear strain dependences in highly strained germanium micromembranes for on-chip light source applications. SPIE Photonics Europe, Apr 2016, Bruxelles, Belgium. ⟨10.1117/12.2227497⟩. ⟨cea-01994511⟩