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Atomic Layer Deposition of Alumina on Silicon Nanotrees, towards the development of 3D ultrastable Aqueous Si Microsupercapacitor

Anthony Valero 1, 2, * Dorian Gaboriau 3, 2 P. Gentile 2 Saïd Sadki 3, 4 
* Corresponding author
1 STEP - Synthèse, Structure et Propriétés de Matériaux Fonctionnels
SYMMES - SYstèmes Moléculaires et nanoMatériaux pour l’Energie et la Santé : DRF/IRIG/SYMMES
2 SiNaps - Silicon Nanoelectronics Photonics and Structures
PHELIQS - PHotonique, ELectronique et Ingénierie QuantiqueS : DRF/IRIG/PHELIQS
3 LEMOH - Laboratoire d'Electronique Moléculaire Organique et Hybride
SYMMES - SYstèmes Moléculaires et nanoMatériaux pour l’Energie et la Santé : DRF/INAC/SYMMES
4 UGA [2016-2019] - Université Grenoble Alpes [2016-2019]
Keywords : Microsupercapacitors Silicon nanotrees High-k dielectrics aqueous electrolytes PEDOT-PSS
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Submitted on : Friday, January 25, 2019 - 11:06:40 AM
Last modification on : Tuesday, January 4, 2022 - 5:10:29 AM
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  • HAL Id : cea-01993877, version 1

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CEA | UGA | CNRS | INAC-SP2M | INC-CNRS | CEA-DRF | IRIG | CEA-GRE | PHELIQS | SYMMES

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Anthony Valero, Dorian Gaboriau, P. Gentile, Saïd Sadki. Atomic Layer Deposition of Alumina on Silicon Nanotrees, towards the development of 3D ultrastable Aqueous Si Microsupercapacitor. 233rd ECS MEETING, May 2018, Seattle, WA, United States. ⟨cea-01993877⟩

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