Atomic Layer Deposition of Alumina on Silicon Nanotrees, towards the development of 3D ultrastable Aqueous Si Microsupercapacitor - Archive ouverte HAL Access content directly
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Atomic Layer Deposition of Alumina on Silicon Nanotrees, towards the development of 3D ultrastable Aqueous Si Microsupercapacitor

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cea-01993877 , version 1 (25-01-2019)

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  • HAL Id : cea-01993877 , version 1

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Anthony Valero, Dorian Gaboriau, P. Gentile, Saïd Sadki. Atomic Layer Deposition of Alumina on Silicon Nanotrees, towards the development of 3D ultrastable Aqueous Si Microsupercapacitor. 233rd ECS MEETING, May 2018, Seattle, WA, United States. ⟨cea-01993877⟩
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