Atomic Layer Deposition of Alumina on Silicon Nanotrees, towards the development of 3D ultrastable Aqueous Si Microsupercapacitor

Anthony Valero (1, 2) , Dorian Gaboriau (3, 2) , P. Gentile (2) , Saïd Sadki (3, 4)

1 STEP - Synthèse, Structure et Propriétés de Matériaux Fonctionnels
2 SiNaps - Silicon Nanoelectronics Photonics and Structures
3 LEMOH - Laboratoire d'Electronique Moléculaire Organique et Hybride
4 UGA [2016-2019] - Université Grenoble Alpes [2016-2019]

Keywords: Microsupercapacitors; Silicon nanotrees; High-k dielectrics; aqueous electrolytes; PEDOT-PSS

Domains: Physics [physics]; Condensed Matter [cond-mat]; Materials Science [cond-mat.mtrl-sci]; Engineering Sciences [physics]; Electric power; Engineering Sciences [physics]; Micro and nanotechnologies/Microelectronics; Engineering Sciences [physics]; Materials

Anthony Valero, Dorian Gaboriau, P. Gentile, Saïd Sadki. Atomic Layer Deposition of Alumina on Silicon Nanotrees, towards the development of 3D ultrastable Aqueous Si Microsupercapacitor. 233rd ECS MEETING, May 2018, Seattle, WA, United States. ⟨cea-01993877⟩