The evolution of the fraction of Er ions sensitized by Si nanostructures in silicon-rich silicon oxide thin films

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Contributor : Jean-Baptiste Jager <>
Submitted on : Tuesday, January 22, 2019 - 3:21:42 PM
Last modification on : Wednesday, June 26, 2019 - 3:26:04 PM

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  • HAL Id : cea-01989752, version 1

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P. Noe, H. Okuno, J.-B. Jager, E Delamadeleine, O. Demichel, et al.. The evolution of the fraction of Er ions sensitized by Si nanostructures in silicon-rich silicon oxide thin films. Nanotechnology, Institute of Physics, 2009, 20 (35), pp.355704. ⟨cea-01989752⟩

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