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The evolution of the fraction of Er ions sensitized by Si nanostructures in silicon-rich silicon oxide thin films

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https://hal-cea.archives-ouvertes.fr/cea-01989752
Contributor : Jean-Baptiste JAGER Connect in order to contact the contributor
Submitted on : Tuesday, January 22, 2019 - 3:21:42 PM
Last modification on : Thursday, August 4, 2022 - 5:07:40 PM

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  • HAL Id : cea-01989752, version 1

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P. Noe, H. Okuno, J.-B. Jager, E Delamadeleine, O. Demichel, et al.. The evolution of the fraction of Er ions sensitized by Si nanostructures in silicon-rich silicon oxide thin films. Nanotechnology, 2009, 20 (35), pp.355704. ⟨cea-01989752⟩

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