Journal Articles
Nanotechnology
Year : 2009
Jean-Baptiste JAGER : Connect in order to contact the contributor
https://hal-cea.archives-ouvertes.fr/cea-01989752
Submitted on : Tuesday, January 22, 2019-3:21:42 PM
Last modification on : Friday, March 24, 2023-2:53:09 PM
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- HAL Id : cea-01989752 , version 1
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P. Noe, H. Okuno, J.-B. Jager, E Delamadeleine, O. Demichel, et al.. The evolution of the fraction of Er ions sensitized by Si nanostructures in silicon-rich silicon oxide thin films. Nanotechnology, 2009, 20 (35), pp.355704. ⟨cea-01989752⟩
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