Performance and Design Considerations for Gate-All-Around Stacked-NanoWires FETs

Abstract : This paper presents recent progress on Gate-All-Around (GAA) stacked-NanoWire (NW) / NanoSheet (NS) MOSFETs. Key technological challenges will be discussed and recent research results presented. Width-dependent carrier mobility in Si NW/NS and FinFET will be analyzed, and intrinsic performance and design considerations of GAA structures will be discussed and compared to FinFET devices with a focus on electrostatics, parasitic capacitances and different layout options. The results show that more flexibility can be achieved with stacked-NS transistors in order to manage power-performance optimization.
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Communication dans un congrès
2017 IEEE International Electron Devices Meeting (IEDM), Dec 2017, San Francisco, United States. 〈10.1109/IEDM.2017.8268473〉
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Contributeur : Sylvain Barraud <>
Soumis le : mardi 8 janvier 2019 - 12:05:14
Dernière modification le : lundi 11 février 2019 - 16:48:02

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S. Barraud, V. Lapras, B. Previtali, M. Samson, J. Lacord, et al.. Performance and Design Considerations for Gate-All-Around Stacked-NanoWires FETs. 2017 IEEE International Electron Devices Meeting (IEDM), Dec 2017, San Francisco, United States. 〈10.1109/IEDM.2017.8268473〉. 〈cea-01973409〉

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