Correlation of electrical characteristics with interface chemistry and structure in Pt/Ru/PbZr$_{0.52}$ Ti$_{0.48}$O$_3$/Pt capacitors after post metallization annealing

Ibrahima Gueye 1 Gwenael Le Rhun 1 Olivier Renault 1 David Cooper 1 Emmanuel Defay 2 Nicholas Barrett 3, *
* Corresponding author
1 CEA-LETI - Laboratoire d'Electronique et des Technologies de l'Information
2 LIST - Luxembourg Institute of Science and Technology
3 LENSIS - Laboratoire d'Etude des NanoStructures et Imagerie de Surface
SPEC - UMR3680 - Service de physique de l'état condensé, IRAMIS - Institut Rayonnement Matière de Saclay
Abstract : We report the effect of post-metallization annealing (PMA) on the electrical behavior of Pt/Ru/PbZr$_{0.52}$ Ti$_{0.48}$O$_3$(PZT)/Pt capacitors and correlations with the physical chemistry of the top electrode/PZT interface. PMA improves the electrical characteristics, in particular the breakdown field while inducing important chemical and structural modifications at the interface. The Ru electrode layer is oxidized and disrupted. There is evidence for the formation of RuO$_x$ and ZrRuO$_x$ metallic phases at the interface but no Pb transport into the electrode region is observed.
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Journal articles
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https://hal-cea.archives-ouvertes.fr/cea-01935332
Contributor : Dominique Girard <>
Submitted on : Monday, November 26, 2018 - 3:59:58 PM
Last modification on : Tuesday, July 16, 2019 - 10:37:55 AM

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CEA | DSM-IRAMIS | IRAMIS-SPEC | CEA-UPSAY | DRT | CEA-DRF | LETI | UNIV-PARIS-SACLAY | CEA-GRE

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Ibrahima Gueye, Gwenael Le Rhun, Olivier Renault, David Cooper, Emmanuel Defay, et al.. Correlation of electrical characteristics with interface chemistry and structure in Pt/Ru/PbZr$_{0.52}$ Ti$_{0.48}$O$_3$/Pt capacitors after post metallization annealing. Applied Physics Letters, American Institute of Physics, 2018, 113, pp.132901. ⟨10.1063/1.5041767⟩. ⟨cea-01935332⟩

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