Characterization of Integrated Nano Materials

Amal Chabli 1, 2 Peter Cherns 2, 1 Chevalier Nicolas 2, 1 David Cooper 2, 1 Lafond Dominique 2, 1 François Bertin 2, 1 Henri Blanc 2, 1 A. Brenac 2, 1 Philippe Andreucci 2, 1 Jean-Christophe Gabriel 2, 1
1 Minatec Grenoble (CEA/ INP Grenoble)
2 CEA-LETI - Laboratoire d'Electronique et des Technologies de l'Information
Abstract : Depending on the level of the technological developments, the characterization techniques are mature to support them or still require protocol definition and relevance demonstration for the issues addressed. For Beyond CMOS and Extreme CMOS devices, the integration of nano-objects like nanowires and carbon nanotubes, brings about analysis requirements that are at the frontier of the state-of-the-art characterization techniques. The specific limitations of the use of the existing physical and chemical characterization techniques for integrated nanomaterials are highlighted. In the case of Scanning Probe Microscopy, in-situ localization and positioning are specifically challenging and data analysis is mainly statistical. It is also shown how specific sample preparation may serve the extraction of the required 3D information in particular for Electron Microscopy. The measurement developments related to NEMS technologies guided by the need for dynamic characterization of these components are covered too.
Keywords : 3D characterization Microscopy Tomography Dynamic properties Nanowires NWs Nanotubes Nanoneedle
Type de document :
Communication dans un congrès
David G. Seiler; Alain C. Diebold; Robert McDonald; C. Michael Garner; Dan Herr; Rajinder P. Khosla; Erik M. Secula. 2009 International Conference on Frontiers of Characterization and Metrology for Nanoelectronics, May 2009, Albany, New York, United States. Melville, Frontiers of Characterization and Metrology for Nanoelectronics. AIP, 2009, 1173, pp.12-20, 2009, Frontiers of Characterization and Metrology for Nanoelectronics. 2009 International Conference on Frontiers of Characterization and Metrology for Nanoelectronics. 〈10.1063/1.3251207〉
Liste complète des métadonnées

Littérature citée [59 références]  Voir  Masquer  Télécharger
https://hal-cea.archives-ouvertes.fr/cea-01549318
Contributeur : Jean Christophe Gabriel <>
Soumis le : mercredi 28 juin 2017 - 16:58:37
Dernière modification le : mercredi 14 février 2018 - 14:05:02
Document(s) archivé(s) le : jeudi 18 janvier 2018 - 01:47:22

Fichier

47-Chabli_caract-3d_Chabli_et_...
Fichiers éditeurs autorisés sur une archive ouverte

Identifiants

Collections

CEA | DRT | LETI

Citation

Amal Chabli, Peter Cherns, Chevalier Nicolas, David Cooper, Lafond Dominique, et al.. Characterization of Integrated Nano Materials. David G. Seiler; Alain C. Diebold; Robert McDonald; C. Michael Garner; Dan Herr; Rajinder P. Khosla; Erik M. Secula. 2009 International Conference on Frontiers of Characterization and Metrology for Nanoelectronics, May 2009, Albany, New York, United States. Melville, Frontiers of Characterization and Metrology for Nanoelectronics. AIP, 2009, 1173, pp.12-20, 2009, Frontiers of Characterization and Metrology for Nanoelectronics. 2009 International Conference on Frontiers of Characterization and Metrology for Nanoelectronics. 〈10.1063/1.3251207〉. 〈cea-01549318〉

Exporter

BibTeX TEI DC DCterms EndNote

Partager

Métriques

Consultations de la notice

42

Téléchargements de fichiers

58

Contact

support.ccsd.cnrs.fr
hal.support@ccsd.cnrs.fr
Logo CCSD