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Journal articles

Tailoring the electronic transitions of NdNiO$_3$ films through (111)$_{pc}$ oriented interfaces

S. Catalano 1, * M. Gibert 1 V. Bisogni 2 F. He 3 R. Sutarto 3 M. Viret 1, 4 P. Zubko 1 R. Scherwitzl 1 G. A. Sawatzky 5 T. Schmitt 2 J.-M. Triscone 1 
* Corresponding author
4 LNO - Laboratoire Nano-Magnétisme et Oxydes
SPEC - UMR3680 - Service de physique de l'état condensé, IRAMIS - Institut Rayonnement Matière de Saclay
Abstract : Bulk NdNiO$_3$ and thin films grown along the pseudocubic (001)$_{pc}$ axis display a 1st order metal to insulator transition (MIT) together with a Néel transition at T = 200 K. Here, we show that for NdNiO$_3$ films deposited on (111)$_{pc}$ NdGaO$_3$, the MIT occurs at T = 335 K and the Néel transition at T = 230 K. By comparing transport and magnetic properties of layers grown on substrates with different symmetries and lattice parameters, we demonstrate a particularly large tuning when the epitaxy is realized on (111)$_{pc}$ surfaces. We attribute this effect to the specific lattice matching conditions imposed along this direction when using orthorhombic substrates.
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Submitted on : Wednesday, March 29, 2017 - 5:53:48 PM
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S. Catalano, M. Gibert, V. Bisogni, F. He, R. Sutarto, et al.. Tailoring the electronic transitions of NdNiO$_3$ films through (111)$_{pc}$ oriented interfaces. APL Materials, AIP Publishing 2015, 3, pp. 062506 ⟨10.1063/1.4919803⟩. ⟨cea-01498292⟩



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