Full field electron spectromicroscopy applied to ferroelectric materials
N. Barrett
(1)
,
J. E. Rault
(2)
,
L. Wang
(3, 4)
,
C. Mathieu
(5)
,
A. Locatelli
(6)
,
T. O. Mentes
(6)
,
A. Niño
(7)
,
S. Fusil
(8)
,
M. Bibes
(8)
,
Alain Barthélémy
(9)
,
D. Sando
(8)
,
W. Ren
(10)
,
S. Prosandeev
(11)
,
L. Bellaiche
(12, 13)
,
B. Vilquin
(14, 15)
,
A. Petraru
,
I. P. Krug
,
C. M. Schneider
(16)
1
LENSIS -
Laboratoire d'Etude des NanoStructures et Imagerie de Surface
2 CHNO - Centre Hospitalier National d'Ophtalmologie des Quinze-Vingts
3 TEDA School of Biological Sciences and Biotechnology
4 Key Laboratory of Molecular Microbiology and Technology
5 Faculté de sciences Economiques et de Gestion
6 Elettra Sincrotrone Trieste
7 LEFS - Laboratorio de Electrofisiologia
8 UMPhy CNRS/THALES - Unité mixte de physique CNRS/Thales
9 XLIM-PHOT - Photonique Fibre et Sources Cohérentes
10 CNITSEC - China Information Technology Security Evaluation Center
11 Department of Physics Department [Fayetteville]
12 Institute for nanosciences and engineering and physics departement [University of Arkansas]
13 Department Physics
14 Université de Lyon
15 INL - H&N - INL - Hétéroepitaxie et Nanostructures
16 ETH Zürich - Eidgenössische Technische Hochschule - Swiss Federal Institute of Technology [Zürich]
2 CHNO - Centre Hospitalier National d'Ophtalmologie des Quinze-Vingts
3 TEDA School of Biological Sciences and Biotechnology
4 Key Laboratory of Molecular Microbiology and Technology
5 Faculté de sciences Economiques et de Gestion
6 Elettra Sincrotrone Trieste
7 LEFS - Laboratorio de Electrofisiologia
8 UMPhy CNRS/THALES - Unité mixte de physique CNRS/Thales
9 XLIM-PHOT - Photonique Fibre et Sources Cohérentes
10 CNITSEC - China Information Technology Security Evaluation Center
11 Department of Physics Department [Fayetteville]
12 Institute for nanosciences and engineering and physics departement [University of Arkansas]
13 Department Physics
14 Université de Lyon
15 INL - H&N - INL - Hétéroepitaxie et Nanostructures
16 ETH Zürich - Eidgenössische Technische Hochschule - Swiss Federal Institute of Technology [Zürich]
M. Bibes
- Function : Author
- PersonId : 184511
- IdHAL : manuelbibes
- ORCID : 0000-0002-6704-3422
- IdRef : 085597392
Alain Barthélémy
- Function : Author
- PersonId : 6301
- IdHAL : alain-barthelemy-limoges
- ORCID : 0000-0002-8589-3842
- IdRef : 070338116
B. Vilquin
- Function : Author
- PersonId : 18099
- IdHAL : bertrand-vilquin
- ORCID : 0000-0002-7404-0019
- IdRef : 070480885
A. Petraru
- Function : Author
I. P. Krug
- Function : Author
Abstract
The application of PhotoEmission Electron Microscopy (PEEM) and Low Energy Electron Microscopy (LEEM) techniques to the study of the electronic and chemical structures of ferroelectric materials is reviewed. Electron optics in both techniques gives spatial resolution of a few tens of nanometres. PEEM images photoelectrons, whereas LEEM images reflected and elastically backscattered electrons. Both PEEM and LEEM can be used in direct and reciprocal space imaging. Together, they provide access to surface charge, work function, topography, chemical mapping, surface crystallinity, and band structure. Examples of applications for the study of ferroelectric thin films and single crystals are presented.