Full field electron spectromicroscopy applied to ferroelectric materials

Abstract : The application of PhotoEmission Electron Microscopy (PEEM) and Low Energy Electron Microscopy (LEEM) techniques to the study of the electronic and chemical structures of ferroelectric materials is reviewed. Electron optics in both techniques gives spatial resolution of a few tens of nanometres. PEEM images photoelectrons, whereas LEEM images reflected and elastically backscattered electrons. Both PEEM and LEEM can be used in direct and reciprocal space imaging. Together, they provide access to surface charge, work function, topography, chemical mapping, surface crystallinity, and band structure. Examples of applications for the study of ferroelectric thin films and single crystals are presented.
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Journal of Applied Physics, American Institute of Physics, 2013, 113 (18), 〈10.1063/1.4801968〉
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https://hal-cea.archives-ouvertes.fr/cea-01477631
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Soumis le : lundi 27 février 2017 - 15:23:29
Dernière modification le : vendredi 16 mars 2018 - 01:13:56

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N. Barrett, J. E. Rault, L. Wang, C. Mathieu, A. Locatelli, et al.. Full field electron spectromicroscopy applied to ferroelectric materials. Journal of Applied Physics, American Institute of Physics, 2013, 113 (18), 〈10.1063/1.4801968〉. 〈cea-01477631〉

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