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Chemistry and structure of BaTiO3 ultra-thin films grown by different O2 plasma power

J.L. Wang 1, * J. Leroy 1 G. Niu 2 G. Saint-Girons 2 B. Gautier 3 B. Vilquin 2 N. Barrett 1 
* Corresponding author
1 LENSIS - Laboratoire d'Etude des NanoStructures et Imagerie de Surface
SPEC - UMR3680 - Service de physique de l'état condensé, IRAMIS - Institut Rayonnement Matière de Saclay
2 INL - H&N - INL - Hétéroepitaxie et Nanostructures
INL - Institut des Nanotechnologies de Lyon
3 INL - DE - INL - Dispositifs Electroniques
INL - Institut des Nanotechnologies de Lyon
Abstract : We present a study of the chemical and atomic properties of 5 nm TiO2-terminated BaTiO3 (001) epitaxialfilms on Nb-doped SrTiO3, as a function of the atomic oxygen plasma power for film growth. Lowerplasma power produces non-stoichiometric films with oxygen vacancies and Ti3+ ions. The larger Ti3+ion radius and the in-plane clamping gives rise to an increase in the out-of-plane lattice parameter.XPS measures the Ti3+ concentration and the concomitant increase in dissociative water uptake in thefilm, giving rise to on-top OH adsorption on surface Ti, proton adsorption on surface oxygen, and a nearsurface Ba-OH environment.
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J.L. Wang, J. Leroy, G. Niu, G. Saint-Girons, B. Gautier, et al.. Chemistry and structure of BaTiO3 ultra-thin films grown by different O2 plasma power. Chemical Physics Letters, Elsevier, 2014, 592, pp.206 - 210. ⟨10.1016/j.cplett.2013.12.030⟩. ⟨cea-01376789⟩



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