J. Néauport, P. Cormont, L. Lamaignère, C. Ambard, F. Pilon et al., Concerning the impact of polishing induced contamination of fused silica optics on laser induced damage density at 351 nm

A. Anedda, C. M. Carbonaro, F. Clemente, and R. Corpino, Ultraviolet excitation fine tuning of luminescence bands of oxygen-deficient centers in silica, Journal of Applied Physics, vol.92, issue.6, pp.3034-3038, 2002.
DOI : 10.1063/1.1499984

J. Néauport, P. Cormont, P. Legros, C. Ambard, and J. Destribats, Imaging subsurface damage of grinded fused silica optics by confocal fluorescence microscopy, Optics Express, vol.17, issue.5, pp.3543-3554, 2009.
DOI : 10.1364/OE.17.003543.m001

L. Skuja, The origin of the intrinsic 1.9 eV luminescence band in glassy SiO2, Journal of Non-Crystalline Solids, vol.179, pp.51-69, 1994.
DOI : 10.1016/0022-3093(94)90684-X

Y. D. Glinka, S. H. Lin, L. P. Hwang, Y. T. Chen, and N. H. Tolk, -based nanoscale materials, Physical Review B, vol.64, issue.8, p.85421, 2001.
DOI : 10.1103/PhysRevB.64.085421

URL : https://hal.archives-ouvertes.fr/jpa-00252320

A. N. Trukhin, M. Goldberg, J. Jansons, H. Fitting, and I. A. Tale, Silicon dioxide thin film luminescence in comparison with bulk silica, Journal of Non-Crystalline Solids, vol.223, issue.1-2, pp.114-122, 1998.
DOI : 10.1016/S0022-3093(97)00437-7