Concerning the impact of polishing induced contamination of fused silica optics on laser induced damage density at 351 nm ,
Ultraviolet excitation fine tuning of luminescence bands of oxygen-deficient centers in silica, Journal of Applied Physics, vol.92, issue.6, pp.3034-3038, 2002. ,
DOI : 10.1063/1.1499984
Imaging subsurface damage of grinded fused silica optics by confocal fluorescence microscopy, Optics Express, vol.17, issue.5, pp.3543-3554, 2009. ,
DOI : 10.1364/OE.17.003543.m001
The origin of the intrinsic 1.9 eV luminescence band in glassy SiO2, Journal of Non-Crystalline Solids, vol.179, pp.51-69, 1994. ,
DOI : 10.1016/0022-3093(94)90684-X
-based nanoscale materials, Physical Review B, vol.64, issue.8, p.85421, 2001. ,
DOI : 10.1103/PhysRevB.64.085421
URL : https://hal.archives-ouvertes.fr/jpa-00252320
Silicon dioxide thin film luminescence in comparison with bulk silica, Journal of Non-Crystalline Solids, vol.223, issue.1-2, pp.114-122, 1998. ,
DOI : 10.1016/S0022-3093(97)00437-7