Impact of storage induced outgassing organic contamination on laser induced damage of silica optics at 351 nm - CEA - Commissariat à l’énergie atomique et aux énergies alternatives Accéder directement au contenu
Article Dans Une Revue Optics Express Année : 2009

Impact of storage induced outgassing organic contamination on laser induced damage of silica optics at 351 nm

Résumé

The impact of storage conditions on laser induced damage density at 351 nm on bare fused polished silica samples has been studied. Intentionally outgassing of polypropylene pieces on silica samples was done. We evidenced an important increase of laser induced damage density on contaminated samples demonstrating that storage could limit optics lifetime performances. Atomic Force Microscopy (AFM) and Gas Chromatography-Mass Spectrometry (GC-MS) have been used to identify the potential causes of this effect. It shows that a small quantity of organic contamination deposited on silica surface is responsible for this degradation. Various hypotheses are proposed to explain the damage mechanism. The more likely hypothesis is a coupling between surface defects of optics and organic contaminants.
Fichier principal
Vignette du fichier
537C6E14-BDB9-137E-CFD4B5E07B2E9D1B_186432.pdf (369.93 Ko) Télécharger le fichier
Origine : Fichiers éditeurs autorisés sur une archive ouverte
Loading...

Dates et versions

cea-01217067 , version 1 (18-10-2015)

Licence

Paternité - Pas d'utilisation commerciale - Pas de modification

Identifiants

Citer

Karell Bien-Aimé, C Belin, Laurent Gallais, Pierre Grua, Evelyne Fargin, et al.. Impact of storage induced outgassing organic contamination on laser induced damage of silica optics at 351 nm. Optics Express, 2009, 17 (21), pp.18703-18713. ⟨10.1364/OE.17.018703⟩. ⟨cea-01217067⟩
159 Consultations
268 Téléchargements

Altmetric

Partager

Gmail Facebook X LinkedIn More