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Journal Articles Applied optics Year : 2015

Shot-to-shot intensity and wavefront stability of high-harmonic generation

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Abstract

We report on the shot-to-shot stability of intensity and spatial phase of high-harmonic generation (HHG). The intensity stability is measured for each high-harmonic (HH) order with a spectrometer. Additionally, the spatial phase is measured with an XUV wavefront sensor for a single HH order measured in a single shot, which according to our knowledge was not reported before with a Hartmann wavefront sensor. Furthermore, we compare the single-shot measurement of the spatial phase with time-integrated measurements and we show that the XUV wavefront sensor is a useful tool to simultaneously optimize the spatial phase and intensity of HHG within the available HHG parameter range used in this study.
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Dates and versions

cea-01162841 , version 1 (11-06-2015)

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Cite

S. Künzel, G. O. Williams, W. Boutu, E. Galtier, B. Barbrel, et al.. Shot-to-shot intensity and wavefront stability of high-harmonic generation. Applied optics, 2015, 54 (15), pp.4745-4749. ⟨10.1364/AO.54.004745⟩. ⟨cea-01162841⟩
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