Shot-to-shot intensity and wavefront stability of high-harmonic generation

S. Künzel 1 G. O. Williams 1 W. Boutu 2 E. Galtier 3 B. Barbrel 4 H. J. Lee 3 B. Nagler 3 U. Zastrau 5, 3 G. Dovillaire 6 R. W. Lee 7 H. Merdji 2 Philippe Zeitoun 8 M. Fajardo 1
1 Instituto de Telecomunicações [Lisboa, Portugal]
2 SPAM - Service des Photons, Atomes et Molécules
3 SLAC National Accelerator Laboratory
4 LBNL - Lawrence Berkeley National Laboratory [Berkeley]
5 Friedrich-Schiller-Universität Jena
6 Imagine Optic
7 Department of Psychics
8 LOA - Laboratoire d'optique appliquée
Abstract : We report on the shot-to-shot stability of intensity and spatial phase of high-harmonic generation (HHG). The intensity stability is measured for each high-harmonic (HH) order with a spectrometer. Additionally, the spatial phase is measured with an XUV wavefront sensor for a single HH order measured in a single shot, which according to our knowledge was not reported before with a Hartmann wavefront sensor. Furthermore, we compare the single-shot measurement of the spatial phase with time-integrated measurements and we show that the XUV wavefront sensor is a useful tool to simultaneously optimize the spatial phase and intensity of HHG within the available HHG parameter range used in this study.
Document type :
Journal articles
Complete list of metadatas
https://hal-cea.archives-ouvertes.fr/cea-01162841
Contributor : Caroline Lebe <>
Submitted on : Thursday, June 11, 2015 - 2:55:47 PM
Last modification on : Wednesday, July 3, 2019 - 10:48:02 AM

Identifiers

Collections

CEA | ENSTA | X | X-LOA | DSM-IRAMIS | ENSTA_LOA | PARISTECH | SPAM | UNIV-PARIS-SACLAY | CEA-DRF | X-DEP-PHYS

Citation

S. Künzel, G. O. Williams, W. Boutu, E. Galtier, B. Barbrel, et al.. Shot-to-shot intensity and wavefront stability of high-harmonic generation. Applied optics, Optical Society of America, 2015, 54 (15), pp.4745-4749. ⟨10.1364/AO.54.004745⟩. ⟨cea-01162841⟩

Export

BibTeX TEI DC DCterms EndNote

Share

Metrics

Record views

207

Contact

CCSD