Shot-to-shot intensity and wavefront stability of high-harmonic generation

S. Künzel (1) , G. O. Williams (1) , W. Boutu (2) , E. Galtier (3) , B. Barbrel (4) , H. J. Lee (3) , B. Nagler (3) , U. Zastrau (5, 3) , G. Dovillaire (6) , R. W. Lee (7) , H. Merdji (2) , Philippe Zeitoun (8) , M. Fajardo (1)

1 Instituto de Telecomunicações [Lisboa, Portugal]
2 SPAM - Service des Photons, Atomes et Molécules
3 SLAC - SLAC National Accelerator Laboratory
4 LBNL - Lawrence Berkeley National Laboratory [Berkeley]
5 Friedrich-Schiller-Universität = Friedrich Schiller University Jena [Jena, Germany]
6 Imagine Optic
7 Department of Psychics
8 LOA - Laboratoire d'optique appliquée

We report on the shot-to-shot stability of intensity and spatial phase of high-harmonic generation (HHG). The intensity stability is measured for each high-harmonic (HH) order with a spectrometer. Additionally, the spatial phase is measured with an XUV wavefront sensor for a single HH order measured in a single shot, which according to our knowledge was not reported before with a Hartmann wavefront sensor. Furthermore, we compare the single-shot measurement of the spatial phase with time-integrated measurements and we show that the XUV wavefront sensor is a useful tool to simultaneously optimize the spatial phase and intensity of HHG within the available HHG parameter range used in this study.

Domains: Physics [physics]; Physics [physics]

S. Künzel, G. O. Williams, W. Boutu, E. Galtier, B. Barbrel, et al.. Shot-to-shot intensity and wavefront stability of high-harmonic generation. Applied optics, 2015, 54 (15), pp.4745-4749. ⟨10.1364/AO.54.004745⟩. ⟨cea-01162841⟩