Abstract : We report on the shot-to-shot stability of intensity and spatial phase of high-harmonic generation (HHG). The intensity stability is measured for each high-harmonic (HH) order with a spectrometer. Additionally, the spatial phase is measured with an XUV wavefront sensor for a single HH order measured in a single shot, which according to our knowledge was not reported before with a Hartmann wavefront sensor. Furthermore, we compare the single-shot measurement of the spatial phase with time-integrated measurements and we show that the XUV wavefront sensor is a useful tool to simultaneously optimize the spatial phase and intensity of HHG within the available HHG parameter range used in this study.
S. Künzel, G. O. Williams, W. Boutu, E. Galtier, B. Barbrel, et al.. Shot-to-shot intensity and wavefront stability of high-harmonic generation. Applied optics, Optical Society of America, 2015, 54 (15), pp.4745-4749. ⟨10.1364/AO.54.004745⟩. ⟨cea-01162841⟩