 |
Journal articles
Low-temperature growth of nano-structured silicon thin films on ITO initiated by metal catalysts
Abstract : Nano-structured silicon thin films have been grown on tin-doped indium oxide (ITO) by Plasma-Enhanced Chemical Vapor Deposition (PECVD) at temperatures lower than 200ºC. Nanometer-scaled aggregates of metal (copper or gold) obtained from evaporated layers were necessary to initiate the nano-structuring growth. Different deposition conditions have been investigated. The highest aspect ratio was obtained with copper and high-pressure plasmas with SiH4 diluted in H2. The metals help dissociating silane so the deposition starts faster on the aggregates than around them, which leads to the nano-structuration. It is likely that the metal remains confined at the interface between ITO and silicon and do not diuse in the silicon layer.
https://hal-cea.archives-ouvertes.fr/cea-01056592
Contributor : Serge Palacin Connect in order to contact the contributor
Submitted on : Wednesday, August 20, 2014 - 11:02:32 AM
Last modification on : Thursday, March 5, 2020 - 6:29:45 PM
Contributor : Serge Palacin Connect in order to contact the contributor
Submitted on : Wednesday, August 20, 2014 - 11:02:32 AM
Last modification on : Thursday, March 5, 2020 - 6:29:45 PM