In situ generation of indium catalysts to grow crystalline silicon nanowires at low temperature on ITO

Pierre-Jean Alet 1 Linwei Yu 2 Gilles Patriarche 3 Serge Palacin 1 Pere Roca I Cabarrocas 2
1 LCSI - Laboratoire de Chimie des Surfaces et Interfaces
2 LPICM - Laboratoire de physique des interfaces et des couches minces [Palaiseau]
3 LPN - Laboratoire de photonique et de nanostructures
Abstract : In situ generation of indium catalyst droplets and subsequent growth of crystalline silicon nanowires on ITO by plasma-enhanced CVD are reported, and the wurtzite (Si-IV) phase is clearly evidenced in some wires
Document type :
Journal articles
Complete list of metadatas

Cited literature [13 references]  Display  Hide  Download
https://hal-cea.archives-ouvertes.fr/cea-01056562
Contributor : Serge Palacin <>
Submitted on : Wednesday, August 20, 2014 - 10:58:59 AM
Last modification on : Wednesday, March 27, 2019 - 4:20:04 PM
Long-term archiving on : Thursday, November 27, 2014 - 11:24:21 AM

File

b813046a.pdf
Publisher files allowed on an open archive

Identifiers

Collections

CEA | X | X-PICM | PARISTECH | LPICM | PUBNIMBE | X-DEP-PHYS

Citation

Pierre-Jean Alet, Linwei Yu, Gilles Patriarche, Serge Palacin, Pere Roca I Cabarrocas. In situ generation of indium catalysts to grow crystalline silicon nanowires at low temperature on ITO. Journal of Materials Chemistry, Royal Society of Chemistry, 2008, 18, pp.5187-5189. ⟨10.1039/b813046a⟩. ⟨cea-01056562⟩

Export

BibTeX TEI DC DCterms EndNote

Share

Metrics

Record views

437

Files downloads

411

Contact

support.ccsd.cnrs.fr
hal.support@ccsd.cnrs.fr
Logo CCSD