Service interruption on Monday 11 July from 12:30 to 13:00: all the sites of the CCSD (HAL, EpiSciences, SciencesConf, AureHAL) will be inaccessible (network hardware connection).
Skip to Main content Skip to Navigation
Journal articles

Localized organic grafting on photosensitive semiconductors susbtrates

Abstract : The aim of this work is to develop a process which allows, in only one step, the localization of organic coating chemically bonded to initially homogeneous substrates. The purpose of this subject is to obtain these properties only because of the coating process (electrografting) itself, and not because of any three-dimensional topological structuring of the substrate nor - a priori - because of selective interactions between the deposited molecules and some areas of the substrate. Photoconductive properties of silicon (chosen here as a reference substrate for its importance in micro-electronics devices) are used to fulfil this goal. By applying local illumination through a mask, local electrografting coating which represents the print of the mask has been obtained.
Document type :
Journal articles
Complete list of metadata
Contributor : Serge Palacin Connect in order to contact the contributor
Submitted on : Wednesday, August 20, 2014 - 10:40:01 AM
Last modification on : Thursday, October 26, 2017 - 7:46:01 AM

Links full text




Julienne Charlier, Elisabeth Clolus, Christophe Bureau, Serge Palacin. Localized organic grafting on photosensitive semiconductors susbtrates. Journal of electroanalytical chemistry and interfacial electrochemistry, Elsevier, 2008, 622, pp.238-241. ⟨10.1016/j.jelechem.2008.06.007⟩. ⟨cea-01056553⟩



Record views