Localized organic grafting on photosensitive semiconductors susbtrates

Abstract : The aim of this work is to develop a process which allows, in only one step, the localization of organic coating chemically bonded to initially homogeneous substrates. The purpose of this subject is to obtain these properties only because of the coating process (electrografting) itself, and not because of any three-dimensional topological structuring of the substrate nor - a priori - because of selective interactions between the deposited molecules and some areas of the substrate. Photoconductive properties of silicon (chosen here as a reference substrate for its importance in micro-electronics devices) are used to fulfil this goal. By applying local illumination through a mask, local electrografting coating which represents the print of the mask has been obtained.