Polishing-induced contamination of fused silica optics and laser induced damage density at 351 nm

Jerome Neauport; L. Lamaignere; H. Bercegol; F. Pilon; J.-C. Birolleau

Polishing-induced contamination of fused silica optics and laser induced damage density at 351 nm

Jerome Neauport ¹ L. Lamaignere ¹ H. Bercegol ¹ F. Pilon ² J.-C. Birolleau ²

1 CESTA - Centre d'études scientifiques et techniques d'Aquitaine

Abstract : In this paper we study the effect of contamination induced by fabrication process on laser damage density of fused silica polished parts at 351 nm in nanosecond regime. We show, owing to recent developments of our raster scan metrology, that a good correlation exists between damage

Document type :

Journal articles

Domain :

Engineering Sciences [physics] / Optics / Photonic

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https://hal-cea.archives-ouvertes.fr/cea-01053354
Contributor : Jerome Neauport <>
Submitted on : Wednesday, July 30, 2014 - 2:33:13 PM
Last modification on : Monday, October 15, 2018 - 4:02:02 PM
Long-term archiving on : Tuesday, November 25, 2014 - 9:06:06 PM

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Polishing-induced contamination of fused silica optics and laser induced damage density at 351 nm

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Polishing-induced contamination of fused silica optics and laser induced damage density at 351 nm

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