Polishing-induced contamination of fused silica optics and laser induced damage density at 351 nm

Jerome Neauport (1) , L. Lamaignere (1) , H. Bercegol (1) , F. Pilon (2) , J.-C. Birolleau (2)

1 CESTA - Centre d'études scientifiques et techniques d'Aquitaine
2 CEA Le Ripault - CEA Le Ripault

In this paper we study the effect of contamination induced by fabrication process on laser damage density of fused silica polished parts at 351 nm in nanosecond regime. We show, owing to recent developments of our raster scan metrology, that a good correlation exists between damage

Domains: Optics / Photonic

Jerome Neauport, L. Lamaignere, H. Bercegol, F. Pilon, J.-C. Birolleau. Polishing-induced contamination of fused silica optics and laser induced damage density at 351 nm. Optics Express, 2005, pp.10163-10171. ⟨10.1364/OPEX.13.010163⟩. ⟨cea-01053354⟩