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Polishing-induced contamination of fused silica optics and laser induced damage density at 351 nm

Abstract : In this paper we study the effect of contamination induced by fabrication process on laser damage density of fused silica polished parts at 351 nm in nanosecond regime. We show, owing to recent developments of our raster scan metrology, that a good correlation exists between damage
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https://hal-cea.archives-ouvertes.fr/cea-01053354
Contributor : Jerome Neauport <>
Submitted on : Wednesday, July 30, 2014 - 2:33:13 PM
Last modification on : Tuesday, October 6, 2020 - 4:30:48 PM
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Jerome Neauport, L. Lamaignere, H. Bercegol, F. Pilon, J.-C. Birolleau. Polishing-induced contamination of fused silica optics and laser induced damage density at 351 nm. Optics Express, Optical Society of America - OSA Publishing, 2005, pp.10163-10171. ⟨10.1364/OPEX.13.010163⟩. ⟨cea-01053354⟩

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