Effect of electric field on laser induced damage threshold of multilayer dielectric gratings

Jerome Neauport (1) , Eric Lavastre (1) , Gérard Razé (1) , Gabriel Dupuy (1) , N. Bonod (2) , M. Balas , G. de Villele , J. Flamand , S. Kaladgew , F. Desserouer

1 CESTA - Centre d'études scientifiques et techniques d'Aquitaine
2 FRESNEL - Institut FRESNEL

This paper studies gratings engraved in multilayer dielectric stacks for ultra high intensity laser compressors application. We design various grating profiles with high reflected efficiencies for 1780 l/mm multilayer dielectric gratings (MLD). Each grating is defined to exhibit a different electric field maximum value in the pillars of the grating. A damage testing facility operating at 1.053 μm, 500 fs pulse duration is used to damage test the parts manufactured from these designs. It is evidenced that for fixed incident angle and materials the damage of the grating is directly related to the electric field intensity maximum in the material, which depends on the groove profile. Laser induced damage thresholds of 5 J/ cm2 are experimentally reached with very high and uniform efficiencies.

Domaines: Optique / photonique

Jerome Neauport, Eric Lavastre, Gérard Razé, Gabriel Dupuy, N. Bonod, et al.. Effect of electric field on laser induced damage threshold of multilayer dielectric gratings. Optics Express, 2007, 15 (19), pp.12508-12522. ⟨10.1364/OE.15.012508⟩. ⟨cea-01053352⟩