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Molecular beam epitaxy of semipolar AlN(1122) and GaN(1122) on m-sapphire

Abstract : We report on the plasma-assisted molecularbeam epitaxy of semipolar AlN(112¯2) and GaN(112¯2) films on (11¯00) m-plane sapphire. AlN deposited on m-sapphire settles into two main crystalline orientation domains, AlN(112¯2) and AlN(101¯0), whose ratio depends on the III/ V ratio. Growth under moderate nitrogen-rich conditions enables to isolate the (112¯2) orientation. The in-plane epitaxial relationships of AlN(112¯2) on m-plane sapphire are [112¯3¯]AlN║[0001]sapphire and [11¯00]AlN║[112¯0]sapphire. GaN deposited directly on m-sapphire results in (112¯2)- oriented layers with (101¯3¯)-oriented inclusions. A ~100 nm-thick AlN(112¯2) buffer imposes the (112¯2)-orientation for the GaN layer grown on top. By studying the Ga-desorption on GaN(112¯2), we conclude that these optimal growth conditions corresponds to a Ga excess of one monolayer on the GaN(112¯2) surface.
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https://hal-cea.archives-ouvertes.fr/cea-00372923
Contributor : Chantal Brassy <>
Submitted on : Thursday, April 2, 2009 - 5:23:53 PM
Last modification on : Tuesday, September 1, 2020 - 3:24:03 PM

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  • HAL Id : cea-00372923, version 1

Citation

Lise Lahourcade, Edith Bellet-Amalric, Eva Monroy, Marie-Pierre Chauvat, Pierre Ruterana. Molecular beam epitaxy of semipolar AlN(1122) and GaN(1122) on m-sapphire. J Mater Sci: Mater Electron, 2008, 19, pp.805-809. ⟨cea-00372923⟩

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