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Fluorescence line narrowing and decay dynamics of Er3+ ions in silicon-rich silicon oxide multilayers

Antoine Al Choueiry 1 Anne-Marie Jurdyc 1 Bernard Jacquier 1 Fabrice Gourbilleau 2 Richard Rizk 2
1 LPCML - Laboratoire de Physico-Chimie des Matériaux Luminescents
2 CIMAP - UMR 6252 - Centre de recherche sur les Ions, les MAtériaux et la Photonique
Abstract : Erbium doped silicon-rich silica layer, known for their potential application for active devices, have been investigated by means of site selective laser spectroscopy and fluorescence dynamics at low temperature. It is pointed out that only one erbium local surrounding is identified within the relaxation limit introduced by the non-resonant fluorescence line narrowing technique. Furthermore, radiative relaxation of erbium ions exhibits a non-exponential behavior tentatively explained by diffusion-limited energy transfer between erbium ions and towards unknown traps.
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https://hal-cea.archives-ouvertes.fr/cea-00372249
Contributor : Chantal Brassy <>
Submitted on : Tuesday, March 31, 2009 - 4:54:26 PM
Last modification on : Wednesday, May 6, 2020 - 5:38:23 PM

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Antoine Al Choueiry, Anne-Marie Jurdyc, Bernard Jacquier, Fabrice Gourbilleau, Richard Rizk. Fluorescence line narrowing and decay dynamics of Er3+ ions in silicon-rich silicon oxide multilayers. Optical Materials, Elsevier, 2008, 30, pp.1889-1894. ⟨10.1016/j.optmat.2007.12.015⟩. ⟨cea-00372249⟩

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