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Strong water repellency effect on SiO2 films processed at a nanometric scale

Abstract : The present study deals with the creation of nano-rough surfaces with stable and controlled high hydrophobicity. These surfaces were obtained by combining the ion track etching technique with a simple functionalization by grafting perfluoroctyltrichlorosilane (PFOTS) molecules. Surface morphology was investigated by AFM observations which evidenced a self-affine fractal structure with a fractal dimension Df ~ 2.6. The study of the wetting properties of these surfaces allowed to elucidate the conditions for observing a high hydrophobicity phenomenon and to predict the contact angle values for surfaces designed at a nanometric scale.
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https://hal-cea.archives-ouvertes.fr/cea-00372177
Contributor : Chantal Brassy <>
Submitted on : Tuesday, March 31, 2009 - 2:50:37 PM
Last modification on : Thursday, October 15, 2020 - 9:00:03 AM

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  • HAL Id : cea-00372177, version 1

Citation

S.M.M. Ramos, Abdenacer Benyagoub, B. Canut, P. de Dieuleveult, G. Messin. Strong water repellency effect on SiO2 films processed at a nanometric scale. European Physical Journal B: Condensed Matter and Complex Systems, Springer-Verlag, 2008, 62, pp.405-410. ⟨cea-00372177⟩

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