Strong water repellency effect on SiO2 films processed at a nanometric scale

S.M.M. Ramos; Abdenacer Benyagoub; B. Canut; P. de Dieuleveult; G. Messin

Journal articles

Strong water repellency effect on SiO2 films processed at a nanometric scale

S.M.M. Ramos ¹ Abdenacer Benyagoub ² B. Canut ³ P. de Dieuleveult ⁴ G. Messin ⁴

1 LPMCN - Laboratoire de Physique de la Matière Condensée et Nanostructures

2 CIMAP - UMR 6252 - Centre de recherche sur les Ions, les MAtériaux et la Photonique

3 INL - S&N - INL - Spectroscopies et Nanomatériaux

INL - Institut des Nanotechnologies de Lyon

4 UCBL - Université Claude Bernard Lyon 1

Abstract : The present study deals with the creation of nano-rough surfaces with stable and controlled high hydrophobicity. These surfaces were obtained by combining the ion track etching technique with a simple functionalization by grafting perfluoroctyltrichlorosilane (PFOTS) molecules. Surface morphology was investigated by AFM observations which evidenced a self-affine fractal structure with a fractal dimension Df ~ 2.6. The study of the wetting properties of these surfaces allowed to elucidate the conditions for observing a high hydrophobicity phenomenon and to predict the contact angle values for surfaces designed at a nanometric scale.

Document type :

Journal articles

Domain :

Physics [physics] / Condensed Matter [cond-mat] / Materials Science [cond-mat.mtrl-sci]

Complete list of metadatas

https://hal-cea.archives-ouvertes.fr/cea-00372177
Contributor : Chantal Brassy <>
Submitted on : Tuesday, March 31, 2009 - 2:50:37 PM
Last modification on : Monday, February 15, 2021 - 12:49:29 PM

Strong water repellency effect on SiO2 films processed at a nanometric scale

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Strong water repellency effect on SiO2 films processed at a nanometric scale

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