Loading...
Derniers dépôts
-
Allan Lebreton, Marie-Paule Besland, Pierre-Yves Jouan, Tatiana Signe, Cédric Mannequin, et al.. Control of microstructure and composition of reactively sputtered vanadium nitride thin films based on hysteresis curves and application to microsupercapacitors. Journal of Vacuum Science & Technology A, 2024, 42 (2), pp.023405. ⟨10.1116/5.0177028⟩. ⟨hal-04423908⟩
-
Michael Rodriguez-Fano, Mohamad Haydoura, Julien Tranchant, Etienne Janod, Benoît Corraze, et al.. Enhancing the Resistive Memory Window through Band Gap Tuning in Solid Solution (Cr1–xVx)2O3. ACS Applied Materials & Interfaces, 2023, 15 (47), pp.54611-54621. ⟨10.1021/acsami.3c09387⟩. ⟨hal-04361024⟩
-
J. Zgheib, L. Berthelot, J. Tranchant, N. Ginot, M.-P. Besland, et al.. Electron-enhanced high power impulse magnetron sputtering with a multilevel high power supply: Application to Ar/Cr plasma discharge. Journal of Vacuum Science & Technology A, 2023, 41 (6), pp.063003. ⟨10.1116/6.0002857⟩. ⟨hal-04299303⟩
-
T Meyer, A Girard, M Bouška, E Baudet, M Baillieul, et al.. Mass spectrometry and in situ x-ray photoelectron spectroscopy investigations of organometallic species induced by the etching of germanium, antimony and selenium in a methane-based plasma. Plasma Sources Science and Technology, 2023, 32 (8), pp.085003. ⟨10.1088/1361-6595/aceaa5⟩. ⟨hal-04186877⟩
-
Anthony Valero, Adrien Mery, Dorian Gaboriau, Marc Dietrich, Maggie Fox, et al.. Redefining high-k dielectric materials vision at nanoscale for energy storage: A new electrochemically active protection barrier. Electrochimica Acta, 2021, 389, pp.138727. ⟨10.1016/j.electacta.2021.138727⟩. ⟨hal-03355843⟩
-
Rémi Dussart, Thomas Tillocher, Gaelle Antoun, Jack Nos, Philippe Lefaucheux, et al.. Plasma cryogenic etching processes: what are the mechanisms involved at very low temperature ?. 14th EU-Japan Joint Symposium on Plasma Processing (JSPP) 2023, Satoshi Hamaguchi, Apr 2023, Okinawa, Japan, Japan. ⟨hal-04072312⟩
-
Gaelle Antoun, Thomas Tillocher, Aurélie Girard, Philippe Lefaucheux, J. Faguet, et al.. Cryogenic nanoscale etching of silicon nitride selectively to silicon by alternating SiF 4 /O 2 and Ar plasmas. Journal of Vacuum Science & Technology A, 2022, 40 (5), pp.052601. ⟨10.1116/6.0001885⟩. ⟨hal-03772077⟩
-
Guillemette Cardinaud, Emmanuel Rozière, Olivier Martinage, Ahmed Loukili, Laury Barnes-Davin, et al.. Calcined clay – Limestone cements: Hydration processes with high and low-grade kaolinite clays. Construction and Building Materials, 2021, 277, pp.122271. ⟨10.1016/j.conbuildmat.2021.122271⟩. ⟨hal-03266209⟩
-
Ahlem Rouahi, Abdelkader Kahouli, Fatiha Challali, Marie-Paule Besland, Corentin Vallée, et al.. Impedance and electric modulus study of amorphous TiTaO thin films: highlight of the interphase effect. Journal of Physics D: Applied Physics, 2013, 46, pp.065308. ⟨10.1088/0022-3727/46/6/065308⟩. ⟨hal-00908474⟩
-
Christina Villeneuve-Faure, M. Mitronika, Laurent Boudou, W Ravisy, M.P. Besland, et al.. Comparison of TiₓSi 1-x O 2 mixed oxide and TiO₂ in SiO₂ nanocomposite dielectric properties at nanoscale. 4th International Conference on Dielectrics (ICD 2022), IEEE, Jul 2022, Palermo, Italy. pp.301-304, ⟨10.1109/ICD53806.2022.9863524⟩. ⟨hal-03863285⟩
Rechercher
Nombre de documents
71
Nombre de notices
281
Mots-clés
Avalanche breakdown
A Chalcogenides
Kirkendall effect
Aluminium nitride
Amyloid precursor
TEM
Cluster Compound
Anatase
Non-volatile memory
BOMBARDMENT
Films
Transfert d'énergie
PECVD
Ablation laser
Calcined clay
Coatings
Coating
Nanocomposite
Scanning electron microscopy
Adsorption
XPS
Cathepsin
Titanium dioxide
Chromophore
Biocapteurs
Plasmas froids
Mott insulator
Oxides
Chemical detection
Plasma etching
B1 Inorganic compounds
Thin film
Transmission electron microscopy
Sputtering
CIGSe
Band alignment
3 nm in size
B2 Semiconducting alloys
B2 Semiconducting indium compounds
Colloidal solution
Thin films
B2 Quaternary
Mott insulators
CH4
X-ray diffraction
Carbon nitride
B Chemical synthesis
Atomic layer etching
Atomic force microscopy
Chalcogenides
A Thin films
Optical properties
Band gap
A1 Characterization
Chlorine
Aryl-diazonium salts
TiO2
Functionalization
AZO thin films
Chalcogenide
Bipolar resistive switching BRS
Resistive switching
Chalcogenide glass
Capacitance
Amorphous
AlN
Alzheimer's disease
Alloying
SF 6
Semiconductors
X-ray photoelectron spectroscopy
Etching
Carbon
NEXAFS
CNTs’ collapse
Applications industrielles
A Multilayers
A-CNx
Ambipolar material
Selenization
Buffer Couple
V2O3
Magnetron sputtering
A3 Physical vapor deposition processes
Nanotubes
Biomasse
C Photoelectron spectroscopy
Biofilms microbiens
B3 Solar cells
CHLORINE PLASMAS
Chemical sensors
Bixbyite
Carbon nanotubes
Structure
Argon InP chlorine etching inductive coupled plasma ICP modeling plasma sheath simulation
Vanadium Sesquioxide
Carbon Nanotube
Chemical and biological sensors
Spectroscopic ellipsometry
CaTiO3Pr^3^+